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Laterally graded periodic Mo/B4C multilayer for extreme ultraviolet wavelength of 6.8-11.0 nm

Zhu Jingtao Li Miao Zhu Shengming Zhang Jiayi Ji Bin Cui Mingqi

朱京涛, 李淼, 朱圣明, 等. 磁控溅射法制备极紫外6.8~11.0 nm波段Mo/B4C横向梯度多层膜[J]. 强激光与粒子束, 2018, 30: 061001. doi: 10.11884/HPLPB201830.170492
引用本文: 朱京涛, 李淼, 朱圣明, 等. 磁控溅射法制备极紫外6.8~11.0 nm波段Mo/B4C横向梯度多层膜[J]. 强激光与粒子束, 2018, 30: 061001. doi: 10.11884/HPLPB201830.170492
Zhu Jingtao, Li Miao, Zhu Shengming, et al. Laterally graded periodic Mo/B4C multilayer for extreme ultraviolet wavelength of 6.8-11.0 nm[J]. High Power Laser and Particle Beams, 2018, 30: 061001. doi: 10.11884/HPLPB201830.170492
Citation: Zhu Jingtao, Li Miao, Zhu Shengming, et al. Laterally graded periodic Mo/B4C multilayer for extreme ultraviolet wavelength of 6.8-11.0 nm[J]. High Power Laser and Particle Beams, 2018, 30: 061001. doi: 10.11884/HPLPB201830.170492

磁控溅射法制备极紫外6.8~11.0 nm波段Mo/B4C横向梯度多层膜

doi: 10.11884/HPLPB201830.170492
基金项目: 

National Natural Science Foundation of China 11375131

National Natural Science Foundation of China U1432244

the Royal Society-NSFC International Exchanges Funding IE141043

the Royal Society-NSFC International Exchanges Funding 11511130051

详细信息
  • 中图分类号: O434

Laterally graded periodic Mo/B4C multilayer for extreme ultraviolet wavelength of 6.8-11.0 nm

Funds: 

National Natural Science Foundation of China 11375131

National Natural Science Foundation of China U1432244

the Royal Society-NSFC International Exchanges Funding IE141043

the Royal Society-NSFC International Exchanges Funding 11511130051

More Information
    Author Bio:

    Zhu Jingtao(1978—), male, professor, engaged in EUV and soft X-ray optics; jtzhu@tongji.edu.cn

  • 摘要: 用直流磁控溅射法结合掩模板控制膜厚的方法在Si衬底上制备了工作于6.8~11.0 nm波段的[Mo/B4C]60横向梯度多层膜。利用X射线掠入射反射测试以及同步辐射反射率测试对梯度多层膜的结构及性能进行了测试。X射线掠入射反射测试结果表明,多层膜周期厚度沿着长轴方向从4.39 nm逐渐增加到7.82 nm,周期厚度平均梯度为0.054 nm/mm。对横向梯度多层膜沿长轴方向每隔5 mm进行了一次同步辐射反射率测试,结果显示,横向梯度多层膜在45°入射角下的反射率约为10%,反射峰的半高全宽介于0.13 nm到0.31 nm之间。
  • Figure  1.  Schematic diagram of the configuration used for the graded sputter deposition

    Figure  2.  GIXRR curves measured at 8.04 keV of different point location x along the mirror

    Figure  3.  Period thickness D of measured location x along the sample

    Figure  4.  Synchrotron radiation measured reflectivity data (open circles) at NSRF for different location x along the mirror with interval 5 mm and their fitted curves (lines) by IMD software

    Table  1.   Measured results of the GIXRR shown in Fig. 2 and the synchrotron radiation (SR) shown in Fig. 4

    measured location x/mm SR reflective peak λ/nm FWHM, Δλ/nm fitted period thickness D by SR/nm calculated period thickness D by GIXRR/nm
    5 10.60 0.31 7.98 7.82
    10 10.12 0.29 7.57 7.44
    15 9.67 0.27 7.19 7.03
    20 9.25 0.27 6.83 6.74
    25 8.80 0.26 6.47 6.47
    30 8.41 0.23 6.10 6.16
    35 8.05 0.20 5.86 5.83
    40 7.69 0.19 5.59 5.56
    45 7.39 0.18 5.34 5.33
    50 7.09 0.17 5.11 5.10
    55 6.79 0.16 4.88 4.88
    下载: 导出CSV
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出版历程
  • 收稿日期:  2017-12-08
  • 修回日期:  2018-01-17
  • 刊出日期:  2018-06-15

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