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X射线掠入射显微成像诊断技术研究进展

徐捷 穆宝忠 陈亮 李文杰 徐欣业 王新 王占山 张兴 丁永坤

徐捷, 穆宝忠, 陈亮, 等. X射线掠入射显微成像诊断技术研究进展[J]. 强激光与粒子束, 2020, 32: 112001. doi: 10.11884/HPLPB202032.200133
引用本文: 徐捷, 穆宝忠, 陈亮, 等. X射线掠入射显微成像诊断技术研究进展[J]. 强激光与粒子束, 2020, 32: 112001. doi: 10.11884/HPLPB202032.200133
Xu Jie, Mu Baozhong, Chen Liang, et al. Progress of grazing incidence X-ray micro-imaging diagnosis technology[J]. High Power Laser and Particle Beams, 2020, 32: 112001. doi: 10.11884/HPLPB202032.200133
Citation: Xu Jie, Mu Baozhong, Chen Liang, et al. Progress of grazing incidence X-ray micro-imaging diagnosis technology[J]. High Power Laser and Particle Beams, 2020, 32: 112001. doi: 10.11884/HPLPB202032.200133

X射线掠入射显微成像诊断技术研究进展

doi: 10.11884/HPLPB202032.200133
基金项目: 国家重点研发计划项目(2017YFA0403300)
详细信息
    作者简介:

    徐 捷(1990—),男,博士后,主要从事X射线光学研究;1310581@tongji.edu.cn

    通讯作者:

    穆宝忠(1975—),男,教授,主要从事X射线光学研究;mubz@tongji.edu.cn

  • 中图分类号: O434.1

Progress of grazing incidence X-ray micro-imaging diagnosis technology

  • 摘要: 高精密的X射线成像诊断是深入理解内爆过程,揭示点火尺度下未知物理问题的关键。基于掠入射反射的X射线显微镜,结合亚纳米级的超光滑球面或非球面反射镜,能够实现空间分辨优于5 μm的高分辨成像。介绍了国际惯性约束聚变领域的X射线显微成像技术发展及应用,重点展示了我国在高分辨X射线(KB)显微镜、多通道X射线KB显微镜以及大视场X射线KBA显微镜方向的进展,分析了下一阶段超高分辨X射线显微成像的研究计划。通过不断的技术创新,我国的X射线显微成像诊断能力已经达到国际先进水平。
  • 图  1  内爆燃料压缩状态的理想与现实[10]

    Figure  1.  Ideal and actual implosion fuel compression

    图  2  KB显微镜的光学结构

    Figure  2.  Optical structure of KB microscope

    图  3  用于NIF装置的四通道KB显微镜结构设计图[33]

    Figure  3.  Structural design drawing of four-channel KB microscope deployed in NIF

    图  4  四通道KB显微镜对Ni网格的成像标定实验结果[34]

    Figure  4.  Experimental results of imaging calibration of Ni grid with four-channel KB microscope

    图  5  (a)16通道KB显微镜采用的异形反射镜;(b)铜网背光成像结果;(c)DT冷冻靶内爆热斑的时间演化图像[38]

    Figure  5.  (a)The special-shaped mirror used in the 16-channel KB microscope;(b)Example framed images obtained with KBFRAMED of a backlit Cu grid;(c)KBFRAMED images of hot-spot X-ray emission from a cryogenic target implosion.

    图  6  应用于Z-pinch装置的Wolter显微镜物镜实物图[41]

    Figure  6.  Picture of Wolter microscope objective applied to Z-pinch device

    图  7  NIF研制的Wolter显微成像系统光路图[42]

    Figure  7.  Optical path diagram of Wolter micro-imaging system developed by NIF

    图  8  多通道超环面镜X射线显微镜及网格背光成像结果[26]

    Figure  8.  Multi-channel toroidal mirror X-ray microscope GXI-1 and grid backlight imaging results

    图  9  三种不同类型薄膜的结构示意图

    Figure  9.  Schematic diagram of three different types of films

    图  10  Ir膜、W/B4C周期多层膜以及非周期多层膜的反射率曲线示意图

    Figure  10.  Reflectance curves of Ir single-layer film,W/B4C periodic multilayer film and non-periodic multilayer film

    图  11  不同薄膜类型的X射线显微成像异同

    Figure  11.  Difference of X-ray imaging with single layer,period multilayer and non-period multilayer films

    图  12  用于系统装调的双周期多层膜示意图

    Figure  12.  Schematic diagram of double-period multilayer film used for system assembly

    图  13  (a)双目瞄准节和(b)KB显微镜的耦合示意图[46]

    Figure  13.  (a)Schematic of the optical binocular system(OBS)and(b) its connection with the KB module

    图  14  (a)网格电镜标定结果;(b)网格背光成像实验结果;(c)分辨率标定结果

    Figure  14.  (a)SEM calibration results of four-quadrant grid;(b)Backlight imaging experiment results of four-quadrant grid;(c)Resolution calibration results

    图  15  高分辨X射线KB显微镜在我国强激光装置上的应用

    Figure  15.  Diagnostic experiments of X-ray KB microscope at Shenguang laser facility

    图  16  时空分辨四通道KB显微镜结构图[47]

    Figure  16.  Optical structure for the time-gated four-channel KB microscope

    图  17  基于“扫描针孔+Si-PIN谱探测器”的X射线显微镜标定方法[48]

    Figure  17.  X-ray microscope intensity calibration method based on “scanning pinhole+Si-PIN spectrum detector”

    图  18  (a)四通道KB显微镜示意图;(b)神光II装置4.75 keV能点下四象限Cu网格成像[49];(c)双扰动振幅CH调制靶分幅成像实验

    Figure  18.  (a)Schematic of four-channel KB microscope;(b)4.75 keV four-channel KB imaging results of four-quadrant Cu grids at Shenguang II laser facility;(c)Diagnostic experiment of double turbulent amplitudes

    图  19  四通道KB显微镜中心视场分辨率

    Figure  19.  Center field of view resolution of four-channel KB microscope

    图  20  四通道KB显微镜热斑测量结果

    Figure  20.  Results of hot-spot measurement with four-channel KB microscope

    图  21  八通道KB显微镜的光学结构与网格背光成像结果[50]

    Figure  21.  Optical structure of eight-channel KB microscope and grid backlight imaging results

    图  22  神光Ⅲ装置开展的两台KB显微镜的协同诊断[46]

    Figure  22.  Experimental configuration for collaborative X-ray imaging diagnostics at Shenguang III laser facility

    图  23  KBA-KB系统结构草图[16]

    Figure  23.  Dual-channel microscope system sketch.

    图  24  2.5 keV与4.3 keV金网格靶内爆静态成像实验[16]

    Figure  24.  Static image of gold mesh target at 2.5 keV and 4.3 keV in implosion experiments

    图  25  STTS构型非球面KBA显微镜光路图

    Figure  25.  Optical path diagram of STTS configuration aspherical KBA microscope

    图  26  超高分辨KB显微镜光学性能仿真

    Figure  26.  Simulation of optical performance of ultra-high resolution KB microscope

    表  1  不同膜系的KB显微镜性能比较

    Table  1.   Comparison of KB microscope performance with different films

    grazing angle/(˚)field of view/µmresolution/µmreflectivity/%image field uniformityenergy resolution
    ir single layer 0.425 160 6 60 high non
    W/B4C periodic multilayer 1.133 200 4 50 low ~30
    W/B4C non-periodic multilayer 1.133 350 5 10 high <10
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  • 收稿日期:  2020-05-19
  • 修回日期:  2020-07-01
  • 刊出日期:  2020-09-13

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