DIAGNOSTICS OF ELECTRON DENSITY IN LASER-PRODUCED Ge PLASMA

Huang Wenzhong; He Shaotang; Kong Linghua; Han Hongjun

Volume 05 Issue 03

Sep. 1993

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Article Navigation > High Power Laser and Particle Beams > 1993 > 05(3): 464-468

Huang Wenzhong, He Shaotang, Kong Linghua, et al. DIAGNOSTICS OF ELECTRON DENSITY IN LASER-PRODUCED Ge PLASMA[J]. High Power Laser and Particle Beams, 1993, 05: 464-468.

Citation:

Huang Wenzhong, He Shaotang, Kong Linghua, et al. DIAGNOSTICS OF ELECTRON DENSITY IN LASER-PRODUCED Ge PLASMA[J]. High Power Laser and Particle Beams, 1993, 05: 464-468.

Huang Wenzhong, He Shaotang, Kong Linghua, et al. DIAGNOSTICS OF ELECTRON DENSITY IN LASER-PRODUCED Ge PLASMA[J]. High Power Laser and Particle Beams, 1993, 05: 464-468.

Citation:

Huang Wenzhong, He Shaotang, Kong Linghua, et al. DIAGNOSTICS OF ELECTRON DENSITY IN LASER-PRODUCED Ge PLASMA[J]. High Power Laser and Particle Beams, 1993, 05: 464-468.

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DIAGNOSTICS OF ELECTRON DENSITY IN LASER-PRODUCED Ge PLASMA

Southwest Institute of Nuclear Physics andChemistry, P. O. Box 525(84), Chengdu, 610003

Received Date: 1993-02-26
Rev Recd Date: 1993-05-15

Available Online: 2026-04-22

Publish Date: 1993-09-20

Abstract

Abstract

XUV spectra from GeXX Ⅱ in laser-produced plasmas are identified. The intensities of the transtions from 3p²P_3/2-3d²D_5/2 and 3^s2S_1/2 -3p²P_3/2 are sensitive to electron densities between 10¹⁹ and 10²¹/cm³ and not sensitive to the electron temperature. Calculations of the intensity ratio vs the electron density are performed. Electron densities in laser-produced Ge plasmas have been deduced from the ratio.
- plasma diagnostic,
- X-ray laser,
- XUV spectra,
- laser-produced plasma