Abstract: The paper focuses on the production of CH film by way of hot wire chemical vapor deposition. The effect of substrate temperature, evaporator temperature and substrate distance on the deposition rate of the CH film is discussed. The CH film with thickness range of 4~30m m is produced with the substrate temperature being 235~265K and the evaporator temperature being 370~410K. It is observed that under the condition of low substrate temperature and appropriate evaporator temperature, the deposition rate would be higher, while substrate distance had little effect on it. The IR spectrum and mass spectrum show that the CH film mainly consists polystyrene.