X光激光薄膜锗靶的制备
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摘要: 介绍了X光激光薄膜锗靶的制备工艺，在厚度为90nm的formvar膜上，采用磁控溅射技术沉积30~60nm厚的锗膜。对锗膜的应力进行了初步的测试与分析，制得的薄膜经干涉仪测量符合要求。Abstract: The fabrication of X 杛ay laser germanium film targets is presented in this paper. The 30~ 60ns thickness germanium film was coated on the 90nm thickness formvar film by using radio 杅requency magnetron sputtering technology. The germanium film targets accord with the demands of experiments by Leitz interference microscope measurement.
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Key words:
- magnetron sputtering /
- germanium film /
- formvar film /
- interferometry /
- stres
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