机械研磨法制备晶体密度钼膜技术研究
Preparation of Mo films with theoretical density by lapping
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摘要: 具有晶体理论密度的高质量金属薄膜对于材料的高温高压状态方程研究十分重要。通过机械研磨抛光技术制备出厚度大于20 μm，均方根粗糙度小于100 nm，厚度一致性好于99％的钼膜。研究了工艺条件对薄膜表面形貌、厚度一致性与表面粗糙度等的影响。机械研磨抛光时，采用较小粒径的磨料和材质较软的研具，可以获得较高的表面质量。在研磨过程中，工件的边缘受到的磨料切削作用最强，采用工件在工装表面均匀分布的形式，薄膜的厚度一致性有较大改善。探讨了目前制备极薄的薄膜工艺存在的问题及可能的解决办法。Abstract: High-quality metal films with theoretical density are important to measurement of equation of state under high temperature and high pressure. Mo films with thickness more than 20 μm, surface roughness(rms) less than 100 nm and thickness uniformity more than 99% have been prepared by lapping in the paper. Influences of process parameters on appearance, thickness uniformity, surface roughness of the films, etc. have been investigated.
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Key words:
- lapping /
- molybdenum (mo) /
- film /
- surface roughness
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