用不同的Mo靶溅射功率制备Mo/Si多层膜
Mo/Si multilayers prepared with different sputtering power of Mo target
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摘要: 用磁控溅射法制备了周期厚度和周期数均相同的Mo/Si多层膜，用原子力显微镜和小角X射线衍射分别研究了Mo靶溅射功率不相同时，Mo/Si多层膜表面形貌和晶相的变化。随后在国家同步辐射实验室测量了Mo/Si多层膜的软X射线反射率。研究发现，随着Mo靶溅射功率的增大，Mo/Si多层膜的表面粗糙度增加，Mo的特征X射线衍射峰也增强，Mo/Si多层膜的软X射线峰值反射率先增大后减小。Abstract: Mo/Si multilayers were prepared by magnetron sputtering. With different sputtering power of Mo target, surface morphology and crystal phases of Mo/Si multilayers were studied by AFM and XRD. Soft X-ray reflectivity of Mo/Si multilayers were measured. As sputtering power of Mo target was increasing, surface roughness of Mo/Si film was increasing, characteristic diffraction peak of Mo species became stronger and stronger, furthermore, soft X-ray peak reflectivity of Mo/Si multilayers first increased and then reduced.
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Key words:
- mo target /
- mo/si multilayers /
- sputtering power /
- soft x-ray /
- reflectivity
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