Fe/Al混合膜的PLD法制备及表面分析
Fabrication and surface analysis of Fe/Al compound films
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摘要: 采用脉冲激光气相沉积（PLD）技术制备了Fe/Al混合膜，测量了该混合膜的光电子能谱（XPS），并采用原子力显微镜（AFM）、扫描电子显微镜（SEM）对Fe/Al混合膜作了表面分析。结果表明：Fe/Al混合膜的表面粗糙度对衬底温度有明显的依赖性， 随着衬底温度的升高，薄膜的表面逐渐变得平滑，膜层变得致密，在200 ℃衬底温度下制得了均方根（rms）粗糙度为0.154 nm、具有原子尺度光滑性的Fe/Al混合膜， 膜中Fe和Al分布比较均匀，其成分比约为1∶3，同时XPS分析也表明Fe/Al混合膜暴露在空气中后表面形成了Al2O3和FeO氧化层。
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关键词:
- 冲激光气相沉积（PLD） /
- Fe/Al混合膜 /
- 光电子能谱（XPS） /
- 衬底温度 /
- 均方根粗糙度
Abstract: Fe/Al compound thin films were fabricated by pulse laser deposition(PLD) and its X-ray photon electron spectroscopy(XPS) examinations were conducted. The surface morphology and oxidation were analyzed with atomic force microscope(AFM) and scanning electron microscope(SEM). The results show that the surface roughness of Fe/Al compound thin films depends on the substrate temperature, the higher the temperature is, the smoother the surface of the film becomes. The rms roughness of the film which was fabricated at a subseracte temperature of 200 ℃ is 0.154 nm. The distribution of Fe and Al in the film is uniform ,and the ratio between Fe and Al in the compound films is 1∶3. An oxidation layer of Al2O3 and FeO is formed at the surface of the Fe/Al compound thin films after exposure to air. -
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