LaB6场发射阵列牺牲层制备工艺
Fabrication technology of sacrificial layer in LaB6 field emission arrays
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摘要: 分析了传统牺牲层材料铝在制备LaB6场发射阵列时存在的问题，利用溅射及热蒸发工艺依次制备铝膜和氧化锌膜，制备出了一种新型的牺牲层——ZnO-Al复合牺牲层，并对所制备的阵列进行了测试。实验结果表明：ZnO-Al复合牺牲层能够有效地解决电化学腐蚀的问题，所制备出的LaB6场发射阵列尖锥保持了完好的形貌，其发射特性也达到了最初制备场发射阵列的要求，说明ZnO-Al复合牺牲层是作为LaB6场发射阵列牺牲层的理想材料。Abstract: This paper analyzes the localization of traditional sacrificial layer material aluminum and brings forward a new sacrificial layer—ZnO-Al complex sacrificial layer. By means of sputtering to prepare aluminum film and evaporating to prepare zinc-oxide film, field emission arrays are fabricated and then tested. The result indicates that ZnO-Al complex sacrificial layer can solve the problem of electrochemistry, the LaB6 field emission array tips with ZnO-Al layer are in good condition and the array maintains field emission characteristics.
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Key words:
- lab6 /
- field emission array /
- sacrificial layer /
- sputtering /
- zno-al
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