真空退火对355nm Al2O3/MgF2高反射薄膜性能的影响
Effects of vacuum annealing on the performance of 355nm Al2O3/MgF2 high reflectance coatings
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摘要: 采用电子束蒸发沉积技术制备了355nm Al2O3/MgF2 高反射薄膜，并在真空中进行不同温度梯度的退火，用X射线衍射（XRD）观察了薄膜微结构的变化，用355nm Nd：YAG脉冲激光测试了薄膜的激光损伤阈值，用Lambda 900光谱仪测试了薄膜的透过和反射光谱。结果表明在工艺条件相同的条件下真空退火过程对薄膜的性能有很大的影响，退火温度梯度越小的样品，吸收越小，阈值越大，并且是非晶结构。选择合适的真空退火过程可以减少355nm Al2O3/MgF2 高反射膜的膜层吸收，提高薄膜的激光损伤阈值。Abstract: The effects of vacuum annealing with different temperature gradient on 355nm Al2O3/MgF2 HR coatings were investigated. A number of samples had been prepared by electron beam evaporation using the same deposition process at optimal deposition temperature of 280℃. After deposition samples were annealed in the coating chamber for three hours with different temperature gradient. The structure of samples had been characterized by X-ray diffraction (XRD). Laser-induced damage threshold (LIDT) was measured by a 355 nm pulsed laser with a pulse width of 8 ns. Transmittance and reflectance of the samples were measured by Lambda 900 Spectrometer. It is found that different temperature gradient of annealing leads to different structures，LIDT and absorption of samples. Decreasing the temperature gra
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Key words:
- annealing process /
- structure /
- laser-induced damage threshold(lidt) /
- absorptance
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