Evolution of plasma sheath in pulsed ion beam extractions
-
摘要: 采用一维无碰撞的动力学鞘层模型计算了脉冲等离子体在恒压引出时的等离子体鞘层厚度变化，分别对短脉冲和长脉冲放电时的离子源发射面演变进行了分析。结果表明：对于短脉冲放电，发射面位置的变化相对等离子体密度的变化存在一定时间的延迟；对于长脉冲的上升沿和直流放电的开启阶段，鞘层厚度变化的速度与离子初始速度相关，稳定后发射面的位置与离子初始速度和等离子体密度的乘积相关。Abstract: A 1D dynamic sheath model of collisionless plasma is used to calculate the change of sheath edge with time. The calculation is performed for short duration pulses and long duration pulses respectively. For short duration pulses, the plasma sheath edge lags behind the plasma density. For long duration pulses, the velocity of the sheath edge movement is correlative to the initial ion velocity. The steady edge location is correlative to the product of the initial ion velocity and the plasma density.
-
Key words:
- pulsed ion beam /
- plasma sheath edge /
- beam extraction /
- thickness of plasma sheath
-
点击查看大图
计量
- 文章访问数: 1072
- HTML全文浏览量: 147
- PDF下载量: 400
- 被引次数: 0
下载:
