Abstract: Along with the development of high energy or high power lasers, especially laser weapon and lasers for controlled nuclear fusion, the laser induced damage threshold of the optical films gradually becomes the bottleneck against the development of the lasers, which is of considerable interest from the world. Laser induced damage mechanism of optical films, test flat and method for laser induced damage threshold were expatiated. The development of researches on the technologies and methods for laser damage resistance of optical films at home and abroad, which included ion beam pretreatment, ion beam or anneal treatment, pretest coating with the materials of high refractive index and so on, were analyzed. The pulsed laser deposition with magnetic filter technology was emphasized in the expectation, and the atom layer deposition was advised to accelerate to develop, which supplied the theoretic base to improve the laser damage resistance of optical films to settle for current requirements.