Review on laser damage fatigue effects of fused silica and other optical materials
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摘要:
以熔石英材料为主，以几种典型（铌酸铋晶体、三硼酸锂晶体和HfO2/SiO2多层膜）的光学材料为辅，介绍了其疲劳效应的主要表现；总结了激光波长、光斑直径、激光频率和材料位置对疲劳效应的影响；介绍了疲劳效应的两种模式：统计性的假疲劳和材料改性的真疲劳；介绍了疲劳效应的三种主要的机理解释：吸收缺陷模型、化学键断裂模型、色心模型；比较了疲劳实验中两种实验模式，并指出了两者的优缺点和适用研究对象。调研表明，对于不同类型的材料，使用不同的激光波长或其他差异条件，就有可能有不同的疲劳现象、源于不同的疲劳机理。
Abstract:Under continuous laser irradiation, the damage threshold of fused silica and other optical materials will continue to decrease, showing the “fatigue effect”, which seriously affects the life and stability of the repetition frequency optical system. This paper introduces the performance under fatigue effect of optical materials mainly fused silica materials, supplemented by several other typical optical materials (bismuth niobate crystal, lithium triborate crystal and HfO2/SiO2 multilayer film). The effects of laser wavelength, spot diameter, laser frequency and material position on fatigue effect are summarized. Two modes of fatigue effect are introduced: statistical false fatigue and material modified true fatigue. Three main mechanisms of fatigue effect are introduced: absorption defect model, bond-breaking model and coloured center model. Two experimental modes in fatigue experiment are compared, and their advantages and disadvantages and applicable research objects are analyzed. Finally, the present research status of this field are summarized, and the future development trend and directions are prospected.
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Key words:
- laser induced damage /
- fatigue effect /
- laser induced defect /
- mechanism of damage
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图 2 紫外条件下波长对疲劳效应的影响
Figure 2. Influence of wavelength on fatigue effect under ultraviolet condition
图 3 石英体内和表面在10 Hz时疲劳效应的区别
Figure 3. Evolution of fatigue effect at 10 Hz for silica surface and bulk
图 4 激光辐照频率对10发辐照后损伤概率的影响
Figure 4. Frequency effect on the laser damage probability after 10 subsequent shots
图 5 在不同泵浦激光脉宽下，入射能量和损伤所需发次的关系
Figure 5. Relationship between incident energy and the number of pulses before damage at various pump pulse durations
图 7 不同激光通量下材料发生损伤所需的次数关系图
Figure 7. Relation diagram of the number of pulses to induce damage in materials at different laser fluence
图 10 在532 nm波长下HfO2/SiO2高反射涂层的损伤显微形貌
Figure 10. Damage micromorphologies of HfO2/SiO2 high reflection coatings at 532 nm
图 11 熔石英的吸收率随激光辐照次数的提升
Figure 11. Absorption coefficient of fused silica increases with the shots
图 12 在固定的电场E下，激光辐照1和3次后，辐照区的电子密度Ne/Ncr和温度Ti的快照
Figure 12. In the fixed electric field E, electron density and temperature snapshots of the irradiated regions subject to one pulse N = 1 and few pulses N = 3 irradiation. The electron density is normalized to the critical value Ncr
图 13 熔石英内几种缺陷的数量随激光激励次数的增加而增加
Figure 13. Number of several types of defects in fused silica increases with the increase of laser excitation times
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