环形正负电子对撞机注入引出分布参数型冲击磁铁设计

吴官健; 王磊; 王冠文; 史晓蕾; 翟心哲; 陈锦晖

doi:10.11884/HPLPB202335.220364

环形正负电子对撞机注入引出分布参数型冲击磁铁设计

doi: 10.11884/HPLPB202335.220364

吴官健^{1, 2,},
王磊^{1, 2},
王冠文²,
史晓蕾²,
翟心哲^{1, 2},
陈锦晖^{1, 2, ,}

1.
中国科学院大学核科学与技术学院，北京 100049
2.
中国科学院高能物理研究所加速器中心，北京 100049

基金项目: 国家自然科学基金项目 (11675194)

详细信息

作者简介:
吴官健，wuguanjian@ihep.ac.cn

通讯作者:
陈锦晖， chenjh@ihep.ac.cn

中图分类号: TL503.3
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- 文章访问数: 480
- HTML全文浏览量: 160
- PDF下载量: 73
- 被引次数: 0
出版历程
- 收稿日期: 2022-10-29
- 修回日期: 2023-02-14
- 录用日期: 2023-02-14
- 网络出版日期: 2023-02-21
- 刊出日期: 2023-04-07

Design of injection and extraction delay-line kicker magnet for circular electron-positron collider

Wu Guanjian^{1, 2
,},
Wang Lei^{1, 2},
Wang Guanwen²,
Shi Xiaolei²,
Zhai Xinzhe^{1, 2},
Chen Jinhui^{1, 2
, ,}

1.
School of Nuclear Science and Technology , University of Chinese Academy of Sciences , Beijing 100049, China
2.
Accelerator Division , Institute of High Energy Physics , Chinese Academy of Sciences , Beijing 100049, China

摘要

摘要: 环形正负电子对撞机（CEPC）是一台周长100 km，最高能量为120 GeV的双环对撞机。为了满足不同能量粒子从增强器注入到对撞环，针对W和Z能量模式设计了对撞环离轴注入系统，用于实现束流的累积。为了提高注入效率，兼容不同注入能量，不同束流填充模式，同时尽可能减少注入过程中冲击磁铁对其它束团的扰动，要求对撞环离轴注入冲击磁铁系统是一个上升时间和下降时间小于200 ns，脉冲底宽调节范围为440～2420 ns的梯形波脉冲放电系统。和常见的集中参数型冲击磁铁相比，分布参数型冲击磁铁具有更优越的动态响应特性，适合产生一个前沿更加陡峭、波形更为理想的梯形波脉冲。根据CEPC的束流注入物理需求，完成了一台分布参数型冲击磁铁的物理设计和结构设计，并采用了PSpice和Opera程序进行模拟仿真。设计结果表明：冲击磁铁由26级LC单元结构叠装而成，磁铁总长为1018 mm，磁有效长度为942 mm；在[−20，20] mm磁铁孔径内，磁场强度为0.042 1 T，磁场均匀性优于±0.2%；冲击磁铁系统总上升时间（10%～90%）为193 ns，下降时间（90%～10%）为191 ns。理论分析、PSpice程序和Opera程序模拟均验证了磁铁设计方案的可行性。
- CEPC /
- 注入引出 /
- 离轴注入 /
- 快脉冲冲击磁铁 /
- 分布参数型冲击磁铁
Abstract: Circular electron-positron collider (CEPC) is a double ring collider with a circumference of 100 km and a maximum energy of 120 GeV. To meet the needs of different energy particles injected from the booster to the collision ring, an off-axis injection system of the collision ring is designed for the W and Z energy modes to realize the accumulation of beam. To improve the injection efficiency, also be compatible with different injection energy, and different beam filling modes, and at the same time reduce the disturbance of other bucket by the kicker magnet during the injection process as much as possible, the off-axis injection kicker magnet system of the collision ring is required to be a trapezoidal wave pulse discharge system with a rise time and falling time of less than 200 ns and a pulse bottom width adjustment range of 440−2420 ns. Compared with the common lumped-inductance kicker magnet, the delay-line kicker magnet has better dynamic response characteristics and is suitable for producing a trapezoidal pulse with steeper front and more ideal waveform. In this paper, according to the physical requirements of beam injection of CEPC, the physical design and structure design of a delay-line kicker magnet are completed, and the PSpice and Opera programs are used for simulation. The design results show that the delay-line kicker magnet is composed of 26 LC units superimposed. The total length of the kicker magnet is 1018 mm, and the magnetic effective length is 942 mm. In [−20, 20] mm magnet aperture, the magnetic field strength is 0.042 1 T, the magnetic field uniformity is better than ±0.2%; the total rise time (10%−90%) of the kicker magnet system is 193 ns, and the fall time (90%−10%) is 191 ns. Theoretical analysis, PSpice program and Opera program simulation all verify the feasibility of the magnet design scheme.
- circular electron-positron collider /
- injection and extraction /
- off-axis injection /
- fast kicker /
- delay-line kicker

HTML全文

图 1 梯形波冲击磁铁系统

Figure 1. Trapezoidal wave kicker system

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图 2 分布参数型冲击磁铁基本单元

Figure 2. Delay-line kicker base unit

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图 3 分布参数型冲击磁铁简化等效电路

Figure 3. Simplified equivalent electric circuit of a delay-line kicker

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图 4 陶瓷真空盒

Figure 4. Ceramic vacuum chamber

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图 5 陶瓷真空盒横截面

Figure 5. Cross section of ceramic vacuum chamber

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图 6 冲击磁铁横截面

Figure 6. Cross section of designed kicker

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图 7 冲击磁铁三维模型

Figure 7. 3D model of designed kicker

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图 8 电容极板重叠面积（空气作为介质）

Figure 8. Overlapping area of capacitor plates (air as medium)

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图 9 三明治电容结构

Figure 9. Sandwich capacitor structure

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图 10 电容极板重叠面积（陶瓷作为介质）

Figure 10. Overlapping area of capacitor plates (ceramic as medium)

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图 11 分布参数型冲击磁铁Opera 2D模型

Figure 11. Opera 2D model of delay-line kicker

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图 12 x轴向磁场分布

Figure 12. Magnetic field distribution along x-axis

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图 13 中心区域磁场分布

Figure 13. Magnetic field distribution of central region

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图 14 分布参数型冲击磁铁系统电路模型

Figure 14. Electric circuit model of delay-line kicker system

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图 15 磁场脉冲时间分布

Figure 15. Time distribution of magnetic field pulse

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表 1 CEPC对撞环离轴注入冲击磁铁系统设计物理要求

Table 1. Physical requirements of CEPC off-axis injection kicker system

repetition rate/Hz	pulse width/ns	flat top/ns	rise (fall) time/ns	kick angle/mrad	integral field strength/(T·m)	beam pipe aperture
1000	440～2420 (adjustable)	0～1980 (adjustable)	＜220	0.1	0.04	75 mm×56 mm

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表 2 镍锌铁氧体性能参数

Table 2. Performance parameters of Ni-Zn ferrite

initial permeability	saturation flux density/mT	residual flux density/mT	coercive force/(A· $ {\mathrm{m}}^{-1} $)	density/ (g· $ {\mathrm{c}\mathrm{m}}^{-3} $)	Curie temperature/℃
2100	330	130	9.5	5.27	130

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表 3 典型的MOSFET和IGBT开关参数

Table 3. Typical MOSFET and IGBT switching parameters

type	V_br/V	T_d(on)/ns	T_r/ns	T_d(off) /ns	T_f/ns
MOSFET	1700	65	20	48	18
IGBT	1200	10	60	530	30

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参考文献(16)

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