Waveform response to high power microwave pulse in time-division multiplexing RF front end
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摘要: 为研究系统级射频设备高功率微波前门效应，采用注入法对某4G基站的滤波器、环形器、低噪放及功放构成的射频前端进行实验研究。结果表明，高功率微波脉冲上升沿和下降沿被射频前端滤波器强烈反射，脉冲平顶段反射很小。反射波形在上升沿及下降沿呈尖峰、在脉冲中部呈平底，显示高功率微波陡峭的上升沿和下降沿包含的丰富的滤波器带外频率成分被反射，导致通过滤波器的脉冲头尾被削弱。经滤波器后，高功率微波脉冲可由环行器进入上行通道低噪放，进而被反射，环行进入下行通道功率放大器，被再次反射，再环行从注入口输出。实验中监测到了经两次反射环行的高功率微波脉冲。说明在高功率脉冲条件下，原本由环形器隔离的下行通道功率放大器同样会承受上行通道进入的高功率微波脉冲损伤的风险。Abstract: To study the high-power microwave front door effect of system-level RF equipment, the injection method was used to conduct experimental research on the RF front end composed of filter, circulator, low-noise amplifier and power amplifier of a 4G base station. The results show that the rising and falling edges of the high-power microwave pulse are strongly reflected by the RF front-end filter, and the reflection of the pulse flat top section is small. The reflected waveform spikes on the rising and falling edges, and the flattened part in the middle of the pulse, showing that the rich out-of-band frequency components of the filter contained in the steep rising and falling edges of the high-power microwaves are reflected, resulting in weakened pulses passing through the filter. After passing through the filter, the high-power microwave pulse can enter the upstream channel low noise amplifier from the circulator, and then be reflected, circulate into the downlink channel power amplifier, be reflected again, and then loop through the injection port output. High-power microwave pulses traveling through two reflection loops were detected in the experiment. This shows that under high-power pulse conditions, the downlink channel power amplifier originally isolated by the circulator is also at risk of damage from the high-power microwave pulse entering the upstream channel. This study has certain reference significance for the study of system-level high-power microwave front door effect.
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图 1 时分复用射频前端模块照片
Figure 1. Photo of the time-division multiplexing RF front end modules
图 3 基站射频前端注入实验示意图
Figure 3. Diagram of injection experiments on base station RF front end
图 6 注入脉冲功率200 mW时注入与反射脉冲波形
Figure 6. Waveforms of the injected pulse and the reflected pulse under 200 mW
图 7 注入脉冲功率20 W时注入波形与反射波形
Figure 7. Waveforms of the injected pulse and the reflected pulse under 20 W
图 8 位于下行微脉冲内的反射脉冲波形
Figure 8. Reflected pulse waveform located in the downlink micro pulses
图 9 同等注入功率不同频率下的反射波形
Figure 9. Waveforms of the reflected pulses with different frequencies but same injection power
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