Lin Jiajin, Zhang Jiande, Yang Jianhua, et al. Voltage adding character of stacked Blumlein lines generator[J]. High Power Laser and Particle Beams, 2014, 26: 045022. doi: 10.11884/HPLPB201426.045022
Citation:
Lin Jiajin, Zhang Jiande, Yang Jianhua, et al. Voltage adding character of stacked Blumlein lines generator[J]. High Power Laser and Particle Beams, 2014, 26: 045022. doi: 10.11884/HPLPB201426.045022
Lin Jiajin, Zhang Jiande, Yang Jianhua, et al. Voltage adding character of stacked Blumlein lines generator[J]. High Power Laser and Particle Beams, 2014, 26: 045022. doi: 10.11884/HPLPB201426.045022
Citation:
Lin Jiajin, Zhang Jiande, Yang Jianhua, et al. Voltage adding character of stacked Blumlein lines generator[J]. High Power Laser and Particle Beams, 2014, 26: 045022. doi: 10.11884/HPLPB201426.045022
The article analyzed the pulse voltage adding character of stacked Blumlein line generator. The parasitical shorted impedance is found to be the main factor affecting the adding efficiency. The parasitical inductance attenuates the flat top, and the attenuation extent depends on the stage number and the ratio between the shorted inductance and the transmission line inductance. The parasitical shorted capacitance slows the rise time, and the relative value depends on the stage number and the ratio between the shorted capacitance and the transmission line capacitance. The jitter of multiple switches leads to the slowing of the rise time and the fall time. Increasing the parasitical shorted impedance and decreasing the switch jitter are the best approaches to improve the adding efficiency and the output waveform.
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