Volume 26 Issue 06
Jun.  2014
Turn off MathJax
Article Contents
Li Yong, Gong Ding, Xuan Chun, et al. Error analysis of drift-diffusion model of semiconductor device numerical simulation[J]. High Power Laser and Particle Beams, 2014, 26: 063204. doi: 10.11884/HPLPB201426.063204
Citation: Li Yong, Gong Ding, Xuan Chun, et al. Error analysis of drift-diffusion model of semiconductor device numerical simulation[J]. High Power Laser and Particle Beams, 2014, 26: 063204. doi: 10.11884/HPLPB201426.063204

Error analysis of drift-diffusion model of semiconductor device numerical simulation

doi: 10.11884/HPLPB201426.063204
  • Received Date: 2013-11-15
  • Rev Recd Date: 2014-03-14
  • Publish Date: 2014-05-15
  • In order to identify and reduce the numerical errors of semiconductor simulator GSRES, drift-diffusion model used in numerical simulation of semiconductor device is studied. Numerical approximation in semiconductor device HPM effect simulator GSRES is analyzed. To build a full physical semiconductor model, Numerical errors caused by approximation of distribution of temperature field in lattice, approximation of recombination rate and generation rate are studied. Application range of simulator is analyzed according to the numerical errors caused by approximation. Terms of the model that need to be improved and enhanced are given.
  • loading
  • 加载中

Catalog

    通讯作者: 陈斌, bchen63@163.com
    • 1. 

      沈阳化工大学材料科学与工程学院 沈阳 110142

    1. 本站搜索
    2. 百度学术搜索
    3. 万方数据库搜索
    4. CNKI搜索
    Article views (2354) PDF downloads(432) Cited by()
    Proportional views
    Related

    /

    DownLoad:  Full-Size Img  PowerPoint
    Return
    Return