A focus automatic positioning system of high-power laser beam based on plasma ultraviolet radiation

Wang Xinmei; Zheng Zebin; Fan Yingbao; Lai Mingwei; Wei Jinyu; Wu Xinyu

doi:10.11884/HPLPB201931.190252

Volume 31 Issue 9

Sep. 2019

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Article Navigation > High Power Laser and Particle Beams > 2019 > 31(9): 091006

Wang Xinmei, Zheng Zebin, Fan Yingbao, et al. A focus automatic positioning system of high-power laser beam based on plasma ultraviolet radiation[J]. High Power Laser and Particle Beams, 2019, 31: 091006. doi: 10.11884/HPLPB201931.190252

Citation:

Wang Xinmei, Zheng Zebin, Fan Yingbao, et al. A focus automatic positioning system of high-power laser beam based on plasma ultraviolet radiation[J]. High Power Laser and Particle Beams, 2019, 31: 091006. doi: 10.11884/HPLPB201931.190252

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A focus automatic positioning system of high-power laser beam based on plasma ultraviolet radiation

doi: 10.11884/HPLPB201931.190252

1.
College of Automation and Information Engineering, Xi'an University of Technology, Xi'an 710048, China
2.
College of Mechanical and Precision Instrument Engineering, Xi'an University of Technology, Xi'an 710048, China
3.
Xi'an Gauss Laser Technology Co., Ltd., Xi'an 710032, China

Received Date: 2019-07-02
Rev Recd Date: 2019-07-02
Publish Date: 2019-09-15

Abstract

Abstract

Accurate focus positioning of a laser beam is an important basis for improving laser engraving, cutting and welding accuracy, but the traditional methods are not fit for automatically finding high-power laser focuses. The plasma caused by laser ablating metal is able to emit a large amount of ultraviolet radiation. Therefore, in this paper a focus automatic positioning method for high-power infrared lasers is proposed and the relevant device is fabricated with a GaN Schottky photodiode as sensor and a 304 stainless-steel laser target as consumable material. As a contrast experiment, the depths of the laser ablation pits on the stainless-steel target are measured with a confocal microscope to find the deepest pits. The focal position difference is 24 μm between the two positioning methods, when the experiments using a 1064-nm-wavelength fiber laser engraving machine with a pulse width of 100 ns, a repetition frequency of 20 kHz and an average power of 10 W.
- high-power laser,
- focus,
- ultraviolet radiation,
- plasma,
- GaN

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References(12)

References

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