Protective layer of oxides and nitrides on the surface of extreme ultraviolet multilayers

Wang Jiaxing; Han Weiming; Zhang Han; Kuang Shangqi

doi:10.11884/HPLPB202537.240216

Volume 37 Issue 2

Feb. 2025

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Wang Jiaxing, Han Weiming, Zhang Han, et al. Protective layer of oxides and nitrides on the surface of extreme ultraviolet multilayers[J]. High Power Laser and Particle Beams, 2025, 37: 021004. doi: 10.11884/HPLPB202537.240216

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Wang Jiaxing, Han Weiming, Zhang Han, et al. Protective layer of oxides and nitrides on the surface of extreme ultraviolet multilayers[J]. High Power Laser and Particle Beams, 2025, 37: 021004. doi: 10.11884/HPLPB202537.240216

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Protective layer of oxides and nitrides on the surface of extreme ultraviolet multilayers

doi: 10.11884/HPLPB202537.240216

Department of Physics, Changchun University of Science and Technology, Changchun 130022, China

Received Date: 2024-06-28
Accepted Date: 2024-11-18
Rev Recd Date: 2024-11-08

Available Online: 2024-11-20

Publish Date: 2025-02-15

Abstract

Abstract

In the process of high energy and high power extreme ultraviolet (EUV) irradiation, carbon deposition and surface oxidation are easy to form on the surface of the EUV mirror, which will affect its reflectivity and shorten its service life. To solve this problem, technology of nitride and oxide capping coating on the surface of extreme ultraviolet multilayer film was studied experimentally and characterized. In the preparation process, based on DC reactive magnetron sputtering coating technology, the “hyperbola” relationship between process gas flow and sputtering voltage was studied, to optimize the control of the amount of reactive gas, and then reduce the influence of reactive gas on Mo/Si multilayer films during reactive sputtering. Based on this method, TiN, ZrN and TiO₂ capping layer were plated on the surface of Mo/Si multilayer films and were characterized by grazing incident X-ray reflection (GIXR), X-ray photoelectron spectroscopy (XPS) and transmission electron microscopy (TEM). It is proved that the nitride capping layer has certain performance advantages.
- extreme ultraviolet multilayers,
- reactive magnetron sputtering,
- surface capping layer,
- nitride/oxide thin film

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References(21)

References

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