Wu Wenjuan, Zhu Jingtao, Zhang Zhong, et al. Narrowband multilayers with low Z materials[J]. High Power Laser and Particle Beams, 2012, 24: 1785-1788. doi: 10.3788/HPLPB20122408.1785
Citation:
Wu Wenjuan, Zhu Jingtao, Zhang Zhong, et al. Narrowband multilayers with low Z materials[J]. High Power Laser and Particle Beams, 2012, 24: 1785-1788. doi: 10.3788/HPLPB20122408.1785
Wu Wenjuan, Zhu Jingtao, Zhang Zhong, et al. Narrowband multilayers with low Z materials[J]. High Power Laser and Particle Beams, 2012, 24: 1785-1788. doi: 10.3788/HPLPB20122408.1785
Citation:
Wu Wenjuan, Zhu Jingtao, Zhang Zhong, et al. Narrowband multilayers with low Z materials[J]. High Power Laser and Particle Beams, 2012, 24: 1785-1788. doi: 10.3788/HPLPB20122408.1785
College of Sciences,Shanghai Institute of Technology,Shanghai 201418,China; 2.Institute of Precision Optical Engineering,Department of Physics,Tongji University,Shanghai 200092,China; 3.National Synchrotron Radiation Laboratory,University of Science and Technology of China,Hefei 230029,China
Mo/Si multilayer are normally used in the early extreme ultraviolet (EUV) astronomical observation. In recent years people want to get observations in higher spectral resolution. Multilayer with low=Z materials have been studied. Four kinds of multilayer, Mg/SiC, Si/SiC, Si/B4C and Si/C multilayer were designed at the wavelength of 30.4 nm and compared with the normal Mo/Si multilayer. All the multilayer were prepared with DC magnetron sputtering, and their reflectivities were measured by synchrotron radiation. The results show that the bandwidth of Mg/SiC multilayer is 1.44 nm, which is the smallest, and the reflectivity is 44%, which is the highest. While the reflectivity of Mo/Si multilayer is only 24% and the bandwidth is 3.11 nm. The bandwidths of multilayer of low=Z materials are narrower than that of the normal multilayer. Therefore, multilayer of low=Z materials can be used in the EUV high spectral resolution field.
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