Volume 24 Issue 12
Nov.  2012
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Ming Jianchuan, Guo Zhiyu, Peng Shixiang. Electron cyclotron resonance ion source for material surface treatment[J]. High Power Laser and Particle Beams, 2012, 24: 2911-2914. doi: 10.3788/HPLPB20122412.2911
Citation: Ming Jianchuan, Guo Zhiyu, Peng Shixiang. Electron cyclotron resonance ion source for material surface treatment[J]. High Power Laser and Particle Beams, 2012, 24: 2911-2914. doi: 10.3788/HPLPB20122412.2911

Electron cyclotron resonance ion source for material surface treatment

doi: 10.3788/HPLPB20122412.2911
  • Received Date: 2012-01-17
  • Rev Recd Date: 2012-07-05
  • Publish Date: 2012-11-05
  • A 2.45 GHz electron cyclotron resonance ion source with permanent magnets has been developed. Its outline dimension is 160 mm in diameter and 90 mm in height, the discharge chambers dimension is 70 mm in diameter and 50 mm in height. The microwave window is made of a f50 mm10 mm BN disk and two f30 mm10 mm ceramic disks. This ion source adopts a three-electrode extraction system and works in the pulsed mode. When the microwave input power is 300 W, the air inflow is 0.4 mL/min, a more than 30 mA peak current of the nitrogen beam can be extracted from a 5 mm emission aperture at 100 kV extraction voltage. The diameter of the beam uniform area on the working plane is more than 200 mm.
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