Using CF₄/Ar/O₂ plasma to modify surface of fused quartz components

The surface of quartz components was decorated by inductively coupled plasma (ICP) sculpture technology with CF4/Ar/O2 mixture gas. The effects of gas flow rate on etching rate, surface roughness and morphology were analyzed in detail. The results show that the surface properties were influenced by the etching effect of CF4 as well as the bombardment of Ar. A reasonable flow ratio of them was determined to improve the surface roughness. Furthermore, by optical microscopy analysis, some important parameters were determined so that the etching process was optimized. This research provides a reference for the study of surface modification of fused quartz components to improve their optical performances.