Measurement and simulation of the back-ejecta of tantalum target material impacted by high intensity current pulse electron beam

Fast photography is used to investigate the back-ejecta of tantalum target material after interaction with high intensity current pulse electron beam. Velocity of back jecta of tantalum target material is presented. The electron beam energy deposition and the beam-target interaction dynamics is also computed numerically by EGS4 program and solving the series of Euler equations for mass, momentum and energy respectively.The experimental result shows that the axial velocity of back ejecta target material is faster than 2.9 mm/μs, while the simulation gives a velocity of 9.7 mm/μs under the ideal conditions. Both results give the necessary parameters for the shutter used to block off the target ejecta．