The study of weak absorption of the high reflection thin films coated on the Si plates at 1315nm by the STL

wang ying-jian; hu hai-yang; li qing-guo; fan zheng-xiu

Volume 12 Issue 07

Dec. 2000

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wang ying-jian, hu hai-yang, li qing-guo, et al. The study of weak absorption of the high reflection thin films coated on the Si plates at 1315nm by the STL[J]. High Power Laser and Particle Beams, 2000, 12.

Citation:

wang ying-jian, hu hai-yang, li qing-guo, et al. The study of weak absorption of the high reflection thin films coated on the Si plates at 1315nm by the STL[J]. High Power Laser and Particle Beams, 2000, 12.

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The study of weak absorption of the high reflection thin films coated on the Si plates at 1315nm by the STL

1.
Shanghai Institute of Optics and Fine Mechanics,Chinese Academy of Sciences, P.O.Box 800-211,Shanghai 201800,China

Publish Date: 2000-12-15

Abstract

Abstract

Using surface thermal lensing method to measure weak absorption of the thin films coated on the Si plates at 1315nm, we have concluded the reason that induced absorption, and can give a measuring guarantee to reduce their absorption and loss in the process of coating thin films．
- surface thermal lensing,
- weak absorption