Volume 14 Issue 05
Oct.  2002
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yu li, liu jing ru, zhang yong sheng, et al. Research on optically pumped XeF(C-A) laser technology[J]. High Power Laser and Particle Beams, 2002, 14.
Citation: yu li, liu jing ru, zhang yong sheng, et al. Research on optically pumped XeF(C-A) laser technology[J]. High Power Laser and Particle Beams, 2002, 14.

Research on optically pumped XeF(C-A) laser technology

  • Publish Date: 2002-10-15
  • In this paper, the kinetics of XeF(C-A) laser were presented. The structures of the surface discharge optically pumping source and the laser devices were introduced. Experimental study and numerical simulation of XeF(CA) laser, as well as the detection of the density of XeF2 were summarized. The development of the radiative source technology was described. The energy deposition efficiency over 80% has been obtained on a module of impacted sectioned surface discharge source and the average deposit power density is about 27MW/cm. The framing photographs of discharge plasma channel under different conditions have been obtained. For multichannel discharge source, the symmetrical synchronous discharge and the photodissociation waves have been obtained.
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