gu chun-shi, wang zhan-shan, wang feng-li, et al. Development of X-ray supermirrors used in Kirkpatrick-Baez microscope[J]. High Power Laser and Particle Beams, 2006, 18.
Citation:
gu chun-shi, wang zhan-shan, wang feng-li, et al. Development of X-ray supermirrors used in Kirkpatrick-Baez microscope[J]. High Power Laser and Particle Beams, 2006, 18.
gu chun-shi, wang zhan-shan, wang feng-li, et al. Development of X-ray supermirrors used in Kirkpatrick-Baez microscope[J]. High Power Laser and Particle Beams, 2006, 18.
Citation:
gu chun-shi, wang zhan-shan, wang feng-li, et al. Development of X-ray supermirrors used in Kirkpatrick-Baez microscope[J]. High Power Laser and Particle Beams, 2006, 18.
Design and fabrication of the X-ray supermirror used as reflective optical element in Kirkpatrick-Baez (KB) microscope were proposed. W/B4C was selected as coating materials pair. Design method and optimization of X-ray supermirrors were discussed. The designed multilayer structure was deposited on the Si wafer substrate using magnetron-sputtering system. The reflectivities of W/B4C supermirrors were measured by X-ray diffraction instrument (8 keV). The reflectivities of supermirrors are 20% at 1.052° and 1.143° designed grazing incident angles. The bandwidth of reflective plateau reaches 0.3°, which can fulfill the requirements of KB microscope.
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