Laser-induced damage threshold of hafnia thin films with chemical method

HfO2 thin films were prepared with chemical method. The influences of heat treatment, UV irradiation and addition of inorganic Al2O3 on laser-induced damage thresholds (LIDT) of HfO2 thin films were studied. HfO2 thin films were characterized by FTIR and X-ray diffraction. And 1-on-1 laser-induced damage threshold tests on HfO2 thin films and HfO2-Al2O3 composite films were carried out with a Q-switched Nd:YAG high power laser at 1 064 nm with a pulse width of 10 ns. The research results showed that the LIDT of the HfO2 thin films could be improved by heating the thin films at 150 ℃.The LIDT of the thin films heated at 150 ℃ was 42.32 J/cm2, which was 82% higher than that of the as-prepared samples. The addition of inorganic Al2O3 to the HfO2 thin films could also enhance the LIDT of thi