Ripple damage mechanism of SiO2 film induced by 1.064 μm pulsed laser

1.064 μm pulsed laser induced ripple damage on SiO2 film which was deposited on K9 glass substrate by electron beam evaporation,was been investigated. The profile of K9 glass was analyzed by scan electronics microscope (SEM ), and the defects on the film were measured by using surface thermal lens (STL). The distribution of light reflected from these defects and bubbles was simulated by finite elements analysis. The experimental results showed that some defects was in the film, and lots of bubbles were found in the K9 glass as well. The simulated results showed that there were ripple damage structure was infected by the reflex laser, the width of stripes increased with the increase of the bubble depth. When the defects were erose, the ripple damage structure might become parallel. And wh