Process of electroless plating on magnetic ICF glass targets

Magnetic ICF glass targets were prepared by electroless plating technology in which magnetic Ni-P coatings covered the surfaces of ICF glass targets. The effects of mass density of main salt, mass density of reducer, mass density of complexant, temperature and pH value of electrolyte on deposition rate of Ni-P plating and bath stability were studied. Then an optimum process of electroless plating on ICF glass targets, in which mass density of main salt NiSO4 is 30 g/L, mass density of reducer NaH2PO2 is 30 g/L, mass density of complexant Na3C6H5O7 is 50 g/L, temperature is (40±2) ℃ and pH value is 10, has been obtained.