Experimental study on main pulse power supply for dicharge produced plasma extreme ultraviolet source

Extreme ultraviolet lithography(EUVL) is regarded as one of the most promising next generation lithographies. Among all the EUVL system technologies, the extreme ultraviolet source is the key issue. Compared with other light sources, gas discharge-produced plasma extreme ultraviolet source has drawn much attention around the world for its advantages in many aspects.The main pulse power generator for the Z-pinch discharge produced plasma extreme ultraviolet source is decribed in this paper, the circuit topology is presented. The critical 3-stage magnetic pulse compression is emphasized, its parameters are presented in the paper. Moreover, a novel configuration of the final magnetic pulse conpression unit is introduced. Experiment results show that each pulse compression effect meets the ant