ye yayun, yuan xiaodong, xiang xia, et al. CO2 laser-cleaning of dimethylsilicone contamination on gilded film surface[J]. High Power Laser and Particle Beams, 2010, 22.
Citation:
ye yayun, yuan xiaodong, xiang xia, et al. CO2 laser-cleaning of dimethylsilicone contamination on gilded film surface[J]. High Power Laser and Particle Beams, 2010, 22.
ye yayun, yuan xiaodong, xiang xia, et al. CO2 laser-cleaning of dimethylsilicone contamination on gilded film surface[J]. High Power Laser and Particle Beams, 2010, 22.
Citation:
ye yayun, yuan xiaodong, xiang xia, et al. CO2 laser-cleaning of dimethylsilicone contamination on gilded film surface[J]. High Power Laser and Particle Beams, 2010, 22.
CO2 laser was utilized to clean the dimethylsilicone contamination on the surface of gilded K9 glass. In the case of point to point laser cleaning, the effects of laser power and radiation time were studied, respectively. Then the laser cleaning effect was studied in the scanning mode. Optical microscope and Fourier transform infrared spectrometer were used to characterize the cleaning effects. The results showed that CO2 laser could effectively remove the dimethylsilicone by properly controlling the laser parameters. In addition, this non-contact cleaning method can clean the gold films on the K9 glass without damage. Finite element analysis code was used to simulate the effects of laser power and radiation time on the temperature of samples. The simulation results w