zhu jun, yu haijun, chen nan, et al. Restriction of tantalum target expansion along axis bombarded by high-current pulsed electron beam[J]. High Power Laser and Particle Beams, 2010, 22.
Citation:
zhu jun, yu haijun, chen nan, et al. Restriction of tantalum target expansion along axis bombarded by high-current pulsed electron beam[J]. High Power Laser and Particle Beams, 2010, 22.
zhu jun, yu haijun, chen nan, et al. Restriction of tantalum target expansion along axis bombarded by high-current pulsed electron beam[J]. High Power Laser and Particle Beams, 2010, 22.
Citation:
zhu jun, yu haijun, chen nan, et al. Restriction of tantalum target expansion along axis bombarded by high-current pulsed electron beam[J]. High Power Laser and Particle Beams, 2010, 22.
The restriction of tantalum target expansion along axis bombarded by high-current pulsed electron beams was studied. The vaporized tantalum target can be blocked by the titanium foil partially vaporized due to the difference of energy deposition in both materials by the electron beam, and furthermore, the energy in tantalum can be absorbed by titanium to lower the expansion speed. By comparison of the holes in the targets formed by the electron beam and the target expansion pictures captured by high speed camera, the restriction of the titanium foil to the tantalum target has been confirmed, and such effect is distinct within 1 μs after the electron beam reaching the target.
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