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CRAFT负离子源中性束注入系统400 keV加速器束流光学特性分析

崔庆龙 韦江龙 谢亚红 梁立振 谢远来 胡纯栋

崔庆龙, 韦江龙, 谢亚红, 等. CRAFT负离子源中性束注入系统400 keV加速器束流光学特性分析[J]. 强激光与粒子束, 2023, 35: 114001. doi: 10.11884/HPLPB202335.230179
引用本文: 崔庆龙, 韦江龙, 谢亚红, 等. CRAFT负离子源中性束注入系统400 keV加速器束流光学特性分析[J]. 强激光与粒子束, 2023, 35: 114001. doi: 10.11884/HPLPB202335.230179
Cui Qinglong, Wei Jianglong, Xie Yahong, et al. Beamlet optics analysis of 400 keV accelerator for CRAFT negative ion based neutral beam injection system[J]. High Power Laser and Particle Beams, 2023, 35: 114001. doi: 10.11884/HPLPB202335.230179
Citation: Cui Qinglong, Wei Jianglong, Xie Yahong, et al. Beamlet optics analysis of 400 keV accelerator for CRAFT negative ion based neutral beam injection system[J]. High Power Laser and Particle Beams, 2023, 35: 114001. doi: 10.11884/HPLPB202335.230179

CRAFT负离子源中性束注入系统400 keV加速器束流光学特性分析

doi: 10.11884/HPLPB202335.230179
基金项目: 国家重大科技基础设施项目 (2018-000052-73-01-001228);国家自然科学基金项目(11975264)
详细信息
    作者简介:

    崔庆龙,qlcui@ipp.ac.cn

    通讯作者:

    韦江龙, jlwei@ipp.ac.cn

  • 中图分类号: TL62+9.1

Beamlet optics analysis of 400 keV accelerator for CRAFT negative ion based neutral beam injection system

  • 摘要: 负离子源中性束注入(NNBI)系统是聚变堆主机关键系统综合研究设施(CRAFT)的组成部分,其目标是开展NNBI相关的科学与工程问题研究,为未来聚变堆NNBI系统的研制与运行积累经验。加速器的束流光学特性决定着最终形成束流的发散性,进而影响着束流在加速器和束线中的传输效率,这对NNBI系统的高功率、高能量、长脉冲运行至关重要。为此,采用IBSimu离子束流模拟程序对目前CRAFT NNBI的400 keV加速器电极系统的物理设计进行束流光学特性分析与评估。目前该套电极结构的设计与ITER负离子源类似,束发散的计算结果满足设计要求。在负离子束流密度较高时(100~300 A/m2范围内),具有更小束发散角;引出距离(5~7 mm范围内)和加速距离(88~110 mm范围内)的适当增加,也呈现出束发散角下降趋势。
  • 图  1  IBSimu程序数值模拟的基本流程图

    Figure  1.  Basic flow chart of the numerical simulation with IBSimu code

    图  2  CRAFT NNBI负离子源结构图

    Figure  2.  Structure of negative ion source of CRAFT NNBI

    图  3  CRAFT NNBI负离子源电极结构与电压关系

    Figure  3.  Aperture structure and voltage relation of the negative ion source for CRAFT NNBI

    图  4  不同的离子电流密度的负离子(红色)和电子(黄色)引出与加速轨迹

    Figure  4.  Trajectories of negative ions (red line) and electrons (yellow line) during extraction and acceleration under different ion current densities

    图  5  不同引出电流密度下,负离子束流在地电极出口处的发散角特性

    Figure  5.  Characteristics of the beamlet divergence at the GG aperture exit under different extracted current densities

    图  6  不同模拟条件下,负离子束流在地电极出口处的发散角特性

    Figure  6.  Characteristics of the beamlet divergence at the GG aperture exit under different simulation conditions

    图  7  不同的加速间距下,负离子束流在地电极出口处的发散角特性

    Figure  7.  Characteristics of the beamlet divergence at the GG aperture exit under different acceleration gaps

    图  8  不同的引出间距下,负离子束流在地电极出口处的发散角特性

    Figure  8.  Character of the beamlet divergence at the GG aperture exit under different extraction gaps

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出版历程
  • 收稿日期:  2023-06-14
  • 修回日期:  2023-10-16
  • 录用日期:  2023-10-16
  • 网络出版日期:  2023-10-21
  • 刊出日期:  2023-11-11

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