关于制备1315nm 45°入射高反射镜的实验研究
The study of making and characteristic of the 45°high reflection thin films at 1315nm
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摘要: 从优化膜系、控制膜厚、改善膜面、均衡应力等四个方面开展了实验研究工作，为制备1315nm 45°高反射镜提供一些判断实验数据，并提出改进的方法，从而使制备的高反射膜取得满意的结果：反射率大于99.8%。Abstract: In order to make 45° high reflection mirror at 1315nm and offer some experimental data, we discuss the following aspectsoptimization of the design of the thin films, the control of the depth of the thin films, the improvement of the surface of the thin films and the balance of the stress in the thin films. we give some methods to improve the characteristic of the thin films, and finally get the satisfied results about the making high reflection mirror:R>99.85%．
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Key words:
- high reflection mirror /
- depth of thin film /
- stress
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