Design of bipolar pulsed magnetron sputtering power supply

Li Bo; Li Boting; Ye Chao; Tan Weiwei; Huang Bin; Zhao Juan; Lu Xiangyang; Huang Yupeng; Zhang Xin; Qi Zhuoyun; Kang Chuanhui

doi:10.11884/HPLPB201830.170393

Volume 30 Issue 4

Apr. 2018

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Li Bo, Li Boting, Ye Chao, et al. Design of bipolar pulsed magnetron sputtering power supply[J]. High Power Laser and Particle Beams, 2018, 30: 045004. doi: 10.11884/HPLPB201830.170393

Citation:

Li Bo, Li Boting, Ye Chao, et al. Design of bipolar pulsed magnetron sputtering power supply[J]. High Power Laser and Particle Beams, 2018, 30: 045004. doi: 10.11884/HPLPB201830.170393

Li Bo, Li Boting, Ye Chao, et al. Design of bipolar pulsed magnetron sputtering power supply[J]. High Power Laser and Particle Beams, 2018, 30: 045004. doi: 10.11884/HPLPB201830.170393

Citation:

Li Bo, Li Boting, Ye Chao, et al. Design of bipolar pulsed magnetron sputtering power supply[J]. High Power Laser and Particle Beams, 2018, 30: 045004. doi: 10.11884/HPLPB201830.170393

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Design of bipolar pulsed magnetron sputtering power supply

doi: 10.11884/HPLPB201830.170393

1.
Key Laboratory of Pulsed Power, Institute of Fluid Physics, CAEP, P.O.Box 919-107, Mianyang 621900, China
2.
School of Physics, Peking University, Beijing 100871, China

Received Date: 2017-10-10
Rev Recd Date: 2017-11-14
Publish Date: 2018-04-15

Abstract

Abstract

Bipolar pulsed power supply is one of the key equipment in magnetron sputtering system. Based on the working principle and technical characteristics of magnetron sputtering, a bipolar pulsed power supply with output voltage of 0-800 V, pulse width of 20-200 μs, frequency of 0-60 Hz, maximum pulse current of 150 A was developed, and the experimental results for the power supply with the water resistance load and the plasma load were obtained. The charging to the energy storage capacitor in the bipolar pulsed power supply was controlled by the DSP control mode. Integrating FPGA, PLC and touch screen man-machine exchange system, the bipolar pulses were got. A large number of experimental demonstration shows that the power supply solves the problems of plasma load discharge et al., and the designed bipolar pulsed power supply achieves the desired sputtering effect and fulfills the requirements of the technical index.
- bipolar pulse,
- FPGA,
- pulse forming network,
- plasma

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References(12)

References

[1]	曲敬信, 汪泓宏. 表面工程手册[M]. 北京: 化学工业出版社, 1998: 367-371. Qu Jingxin, Wang Honghong. Surface engineering manual. Beijing: Chemical Industry Press, 1998: 367-371
[2]	张以忱. 真空镀膜技术[M]. 北京: 冶金工业出版社, 2009: 26-53. Zhang Yichen. Vacuum coating technology. Beijing: Metallurgical Industry Press, 2009: 26-53
[3]	邵桂荣, 畅福善. 基于DSP的磁控溅射电源的设计与实现[J]. 电力电子技术, 2011, 45(5): 90-92. doi: 10.3969/j.issn.1000-100X.2011.05.033 Shao Guirong, Chang Fushan. The design and implementation of magnetron sputtering power based on DSP. Power Electronics, 2011, 45(5): 90-92 doi: 10.3969/j.issn.1000-100X.2011.05.033
[4]	黄西平, 刘洋, 孙强, 等. 脉冲磁控溅射电源控制策略的研究[J]. 西安理工大学学报, 2015, 31(4): 443-447. doi: 10.3969/j.issn.1006-4710.2015.04.011 Huang Xiping, Liu Yang, Sun Qiang, et al. The research of control strategy for pulse magnetron sputtering power supply. Journal of Xi'an University of Technology, 2015, 31(4): 443-447 doi: 10.3969/j.issn.1006-4710.2015.04.011
[5]	Musil J, Vlcek J. A perspective of magnetron sputtering in surface engineering[J]. Surface and Coatings Technology, 1999, 112(1): 162-169.
[6]	Musil J. Recent advances in magnetron sputtering technology[J]. Surface and Coatings Technology, 1998, 100(1): 280-286.
[7]	王勇. 磁电等离子体技术用于汽车节能减排的实验研究[D]. 重庆: 重庆大学, 2010. Wang Yong. The experimental study of magnetism electric plasma for energy-saving and emission reduction of the car. Chongqing: Chongqing University, 2010
[8]	戴茂飞. 脉冲调制射频磁控溅射电源的研制[D]. 长沙: 中南民族大学, 2012. Dai Maofei. The research on pulse modulation RF power supply for magnetron sputtering. Changsha: South-central University for Nationalities, 2012
[9]	赵娟, 曹科峰, 曹宁翔, 等. 脉冲氙灯放电闪光仪[J]. 国外电子测量技术, 2009, 28(6): 52-53. doi: 10.3969/j.issn.1002-8978.2009.06.015 Zhao Juan, Cao Kefeng, Cao Ningxiang, et al. A strobo of pulse xenon lamp discharge. Foreign Electronic Measurement Technology, 2009, 28(6): 52-53 doi: 10.3969/j.issn.1002-8978.2009.06.015
[10]	李波, 李博婷, 黄斌, 等. 高可靠性脉冲氙灯电源设计[J]. 强激光与粒子束, 2017, 29: 065004. doi: 10.11884/HPLPB201729.160468 Li Bo, Li Boting, Huang Bin, et al. Design of high reliability pulse xenon lamp power supply. High Power Laser and Particle Beams, 2017, 29: 065004 doi: 10.11884/HPLPB201729.160468
[10]	江伟华. 基于固态器件的高重频脉冲功率技术[J]. 强激光与粒子束, 2010, 22(3): 561-564. http://www.hplpb.com.cn/article/id/27 Jiang Weihua. High repetition-rate pulsed power generation using solid-state switches. High Power Laser and Particle Beams, 2010, 22(3): 561-564 http://www.hplpb.com.cn/article/id/27
[11]	李亚维, 谢敏, 蓝欣, 等. 200 kV低纹波高稳定度直流高压电源[J]. 强激光与粒子束, 2016, 28: 015016. doi: 10.11884/HPLPB201628.015016 Li Yawei, Xie Min, Lan Xin, et al. A 200 kV high voltage DC power supply with high stability and low ripple. High Power Laser and Particle Beams, 2016, 28: 015016 doi: 10.11884/HPLPB201628.015016