Volume 36 Issue 12
Nov.  2024
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Xie Zhiyong, Ye Junjian, Jia Guo, et al. Fabrication technology of Al/Ta-Nb alloy impedance matching target[J]. High Power Laser and Particle Beams, 2024, 36: 122003. doi: 10.11884/HPLPB202436.240025
Citation: Xie Zhiyong, Ye Junjian, Jia Guo, et al. Fabrication technology of Al/Ta-Nb alloy impedance matching target[J]. High Power Laser and Particle Beams, 2024, 36: 122003. doi: 10.11884/HPLPB202436.240025

Fabrication technology of Al/Ta-Nb alloy impedance matching target

doi: 10.11884/HPLPB202436.240025
  • Received Date: 2024-01-19
  • Accepted Date: 2024-09-29
  • Rev Recd Date: 2024-09-29
  • Available Online: 2024-10-16
  • Publish Date: 2024-11-08
  • To obtain the equation of state (EOS) of tantalum-niobium alloy (Ta-Nb) materials under high pressure, a type of Al/Ta-Nb impedance matching target for laser EOS experiments was fabricated. The processes of precision rolling and femtosecond laser cutting of Ta-Nb alloy foil were studied. A step sample of Ta-Nb alloy with a thickness of 13 μm and a width of 400 μm was obtained. Ta-Nb alloy step was assembled with Al standard material using polyvinyl alcohol (PVA) hydrosol. The surface morphology, step thickness and sample density of the target were measured by white light interferometer and electronic densitometer. The results show that the Al/Ta-Nb alloy impedance matching target fabricated can meet the requirements of laser EOS experiments.
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