Volume 37 Issue 3
Feb.  2025
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Tian Qing, Liu Yi, Yang Liu, et al. Development of a control system for power supplies in a high repetition rate X-ray free electron laser facility[J]. High Power Laser and Particle Beams, 2025, 37: 035020. doi: 10.11884/HPLPB202537.240423
Citation: Tian Qing, Liu Yi, Yang Liu, et al. Development of a control system for power supplies in a high repetition rate X-ray free electron laser facility[J]. High Power Laser and Particle Beams, 2025, 37: 035020. doi: 10.11884/HPLPB202537.240423

Development of a control system for power supplies in a high repetition rate X-ray free electron laser facility

doi: 10.11884/HPLPB202537.240423
  • Received Date: 2024-12-13
  • Accepted Date: 2025-02-28
  • Rev Recd Date: 2025-01-31
  • Available Online: 2025-03-11
  • Publish Date: 2025-03-15
  • This paper presents a control system based on EPICS (Experimental Physics and Industrial Control System) for multiple low-energy and high-energy power supplies configured along the injector prototype of a high-repetition-rate XFEL (X-ray Free Electron Laser) facility. Due to the global applicability of EPICS in accelerator technology and its established technical foundation in China, the system is designed based on the EPICS architecture. It employs a hierarchical distributed network structure, establishes Channel Access (CA) based on the TCP/IP protocol, and offers application interface subroutine libraries for both clients and servers. The driver development of all underlying power devices is completed through a unique device communication driver software module based on data flow. And the client control software is developed based on CSS (Control System Studio). This system fulfills users’ requirements for real-time centralized remote monitoring and control of power supplies, as well as data sharing with other related subsystems, which improves the operating efficiency and reliability of the device.
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