The study of making and characteristic of the 45°high reflection thin films at 1315nm

In order to make 45° high reflection mirror at 1315nm and offer some experimental data, we discuss the following aspectsoptimization of the design of the thin films, the control of the depth of the thin films, the improvement of the surface of the thin films and the balance of the stress in the thin films. we give some methods to improve the characteristic of the thin films, and finally get the satisfied results about the making high reflection mirror:R>99.85%．