wang ying-jian, hu hai-yang, li qing-guo, et al. The study of weak absorption of the high reflection thin films coated on the Si plates at 1315nm by the STLJ. High Power Laser and Partical Beams, 2000, 12(07).
Citation:
wang ying-jian, hu hai-yang, li qing-guo, et al. The study of weak absorption of the high reflection thin films coated on the Si plates at 1315nm by the STLJ. High Power Laser and Partical Beams, 2000, 12(07).
wang ying-jian, hu hai-yang, li qing-guo, et al. The study of weak absorption of the high reflection thin films coated on the Si plates at 1315nm by the STLJ. High Power Laser and Partical Beams, 2000, 12(07).
Citation:
wang ying-jian, hu hai-yang, li qing-guo, et al. The study of weak absorption of the high reflection thin films coated on the Si plates at 1315nm by the STLJ. High Power Laser and Partical Beams, 2000, 12(07).
The study of weak absorption of the high reflection thin films coated on the Si plates at 1315nm by the STL
Using surface thermal lensing method to measure weak absorption of the thin films coated on the Si plates at 1315nm, we have concluded the reason that induced absorption, and can give a measuring guarantee to reduce their absorption and loss in the process of coating thin films．
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