Pulse laser vapor deposition technology and its application in fabrication of the ICF filmtargets

The multifilms targets are often used in the studies of ICF experiment and astrophysical opacity. One of the methods producing these targets is the Pulse Laser Deposition (PLD) technology. In this paper, the principle of PLD technology, experiment method, PLD equipment design and the application in fabrication of the ICF filmtargets have been described in detail. Using PLD method, the Cu films and Cu/Fe films were been produced. The average roughness of Cu films is 0.2nm and Cu/Fe films is 0.4nm. Experiments shown that the equipment and the methods were suitable.