Aluminium target with deep amplitude modulation fabricated by chemical wet etching process

The aluminium modulation target used to study the Rayleigh-Taylor instability in the resolved experiments of Inertial Confined Fusion (ICF) was fabricated. Based on semiconductor photolithography technology and chemical wet etching process, the stripe pattern of line width 25 μm on aluminium foil surface was obtained. The effects of the reaction conditions on the etching rate were studied. The pattern topography and the surface constituent were measured and analyzed. Aluminium modulation targets of about 32 μm thick were prepared and the etching depth reached up to 20 μm.