gong chun-zhi, tian xiu-bo, cao zhen-en, et al. 10 kV high voltage pulse power supply for plasma surface modificationJ. High Power Laser and Partical Beams, 2007, 19(11).
Citation: gong chun-zhi, tian xiu-bo, cao zhen-en, et al. 10 kV high voltage pulse power supply for plasma surface modificationJ. High Power Laser and Partical Beams, 2007, 19(11).

10 kV high voltage pulse power supply for plasma surface modification

  • The series connected circuit structure with synchronous drive technology, which is composed of 12 relatively independent pulse power supplies, is used in order to acquire 10 kV high voltage pulse. The design is modularized and different voltage output can be realized through varying the number of pulse power units. The output parameters of the power supply are as follows: the peak voltage 0.1~10.0 kV, the pulse frequency 0.2~2.0 kHz, the duty cycle 5%~30%, the pulse current magnitude 20 A, and the pulse power 200 kW. Experiments have demonstrated that the power supply is stable and reliable in plasma surface modification processes.
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