Effect of annealing process on cold rolled Ni film for ICF target

Films are usually annealed to ameliorate their structure and improve mechanical properties in need of inertial confinement fusion(ICF) and equation of state(EOS) experiment and procedure of target assembly. Ni films with surface root mean square roughness less than 50 nm, 7 mm thick were fabricated after process annealing at 450~700 ℃. The metallographs of Ni films show that the stripped grains have been changed in to equiaxed grains after annealing at 500 ℃ for 1 h. The hardness of Ni film has changed from 4 GPa to 2.3 GPa after annealing. The X-ray diffraction spectra of Ni fims show that diffraction peak at high angle appears after annealing at temperature higher than 500 ℃，which means the texture has been moderated to some extent, and the suitable temperature for Ni film annealing