Mo/Si multilayers prepared with different sputtering power of Mo target

Mo/Si multilayers were prepared by magnetron sputtering. With different sputtering power of Mo target, surface morphology and crystal phases of Mo/Si multilayers were studied by AFM and XRD. Soft X-ray reflectivity of Mo/Si multilayers were measured. As sputtering power of Mo target was increasing, surface roughness of Mo/Si film was increasing, characteristic diffraction peak of Mo species became stronger and stronger, furthermore, soft X-ray peak reflectivity of Mo/Si multilayers first increased and then reduced.