mu wei-bing, xu xi. 80C196KC20 microprocessor irradiated by X-ray in different directionsJ. High Power Laser and Partical Beams, 2007, 19(02).
Citation: mu wei-bing, xu xi. 80C196KC20 microprocessor irradiated by X-ray in different directionsJ. High Power Laser and Partical Beams, 2007, 19(02).

80C196KC20 microprocessor irradiated by X-ray in different directions

  • X-ray is produced by SJ-A X-ray tube in China Academy of Measurement and Test Technology, Chengdu,and 80C196KC20 microprocessor is irradiated by X-ray in different directions. The direction is defined along the line which is perpenticular to the surface of the microprocessor. The results of the test show that the effect of X-ray to the microprocessor decreases while the angle changes from 0° to 90°. The main reason is that X-ray may go through different thickness of the crust of device when the device is irradiated in different directions.
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