shi jiangjun, li xianwen, liu jun. DEPENDENCE OF EXPOSURE FOR FLASH X RAY RADIOGRAPHY ON ELECTRON BEAM PARAMETERSJ. High Power Laser and Partical Beams, 1998, 10(01).
Citation:
shi jiangjun, li xianwen, liu jun. DEPENDENCE OF EXPOSURE FOR FLASH X RAY RADIOGRAPHY ON ELECTRON BEAM PARAMETERSJ. High Power Laser and Partical Beams, 1998, 10(01).
shi jiangjun, li xianwen, liu jun. DEPENDENCE OF EXPOSURE FOR FLASH X RAY RADIOGRAPHY ON ELECTRON BEAM PARAMETERSJ. High Power Laser and Partical Beams, 1998, 10(01).
Citation:
shi jiangjun, li xianwen, liu jun. DEPENDENCE OF EXPOSURE FOR FLASH X RAY RADIOGRAPHY ON ELECTRON BEAM PARAMETERSJ. High Power Laser and Partical Beams, 1998, 10(01).
DEPENDENCE OF EXPOSURE FOR FLASH X RAY RADIOGRAPHY ON ELECTRON BEAM PARAMETERS
The effects of energy, emittance, radius on target, and transverse distribution of an electron beam on the exposure at a meter from target and on the exposure angular distribution are researched in the paper. It is found that the effects of the parameters, especially of energy, emittance, and radius on target, are serious and must be considered in the design of flash X ray radiographic machine.
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