Investigation on electropolishing of Ti film

The influence of electrolyte component on the surface roughness and topography of Ti film has been analyzed. It is found that, the solution of sulfuric acid and methanol is an ideal electrolyte system compared with the other electrolyte systems mentioned in this paper. The Ti films with surface mean roughness value less than 30 nm were obtained under appropriate electropolishing process conditions such as polishing potential, temperature, time, flow rate etc.The relation between anodic potential and removal rate of the metal was investigated in the solution of sulfuric acid and methanol.The removal rate increases with the polishing potential increasing at the initiative stage of polishing. When the potential reaches 28～42 V,the rate keeps almost constant. The rate increases swift again w