HfO2 optical films prepared by dual ion beam sputtering deposition

HfO2 films have been deposited by dual-ion beam sputtering technology with starting material Hf. Optical, residual stress, structural properties and laser-induced damage threshold of the HfO2 films have been studied. It is found that the HfO2 shows uniform structural properties, film compact and structure and higher laser-induced damage threshold. The relation between structural and damage threshold of HfO2 films has also been studied.