Effects of sputtering power on structure and property of Mo films deposited by DC magnetron sputtering

Mo films were fabricated at different sputtering powers by DC magnetron sputtering. The deposition rate, surface topography and crystal structure of Mo films were studied. The effects of sputtering power on grain size and stress of Mo films were discussed. AFM analyses show that when sputtering power increases from 20 W to 100 W, the roughness of Mo films raises. The X-ray diffraction analysis indicates that all the films are in cubic polycrystal structure. The grain size varies from 14.1 nm to 17.9 nm, and the stress in the Mo films increases firstly and then decreases as the sputtering power increases, reaching a maximum of 2.383 GPa at the sputtering power of 40 W.