dai ling, qi kangcheng, lin zulun, et al. Fabrication technology of sacrificial layer in LaB6 field emission arraysJ. High Power Laser and Partical Beams, 2009, 21(06).
Citation: dai ling, qi kangcheng, lin zulun, et al. Fabrication technology of sacrificial layer in LaB6 field emission arraysJ. High Power Laser and Partical Beams, 2009, 21(06).

Fabrication technology of sacrificial layer in LaB6 field emission arrays

  • This paper analyzes the localization of traditional sacrificial layer material aluminum and brings forward a new sacrificial layer—ZnO-Al complex sacrificial layer. By means of sputtering to prepare aluminum film and evaporating to prepare zinc-oxide film, field emission arrays are fabricated and then tested. The result indicates that ZnO-Al complex sacrificial layer can solve the problem of electrochemistry, the LaB6 field emission array tips with ZnO-Al layer are in good condition and the array maintains field emission characteristics.
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